WebJun 27, 2014 · We use controlled and low substrate temperatures during plasma etching of a chromium hard mask and then the underlying substrate as a route to high aspect ratio sub-10 nm silicon features derived from BCP lithography. Siloxane masks were fabricated… Expand View on IOP Publishing ncbi.nlm.nih.gov Save to Library Create Alert Cite 14 … WebThe pattern is then transferred from the ARC layer into the chromium hard-mask layer by wet chemical etching. The chromium layer is etched using CR-7, a commercially available chromium etchant by Cyantek Corporation. Two characteristics of the fabrication process are very important to note at this point.
Hard Chrome Surfaces: Adhesion, Masking, …
WebEtchant Type A, titanium wet etchant, CR-7 chromium etchant, CR-14 chromium etchant, molybdenum etchant, warm hydrogen peroxide, Copper Etchant Type CE-200, Copper Etchant APS ... It may find use as a hard mask for plasma etching due to its low etch rate, and as a dry lubricant in MEMS. B. Silicon Dioxide Fused Quartz Wafer: Wafers of … WebChromium acid CAS No. 1333-82-0. Chromium metal (Cr) is a bluish to steel-gray brittle solid, often seen in gray powder form that burns if flame heated. Chromium is also found … porsche cayenne miami blue
Guide to Hard Chrome Plating Hard Chrome Specialists
WebNov 10, 2024 · The parameters for transferring the features from the nanoimprinted resist into the chromium hard mask can be found in Table 1. Table 1 Parameters for the Cr etch. Full size table. The features were then transferred from the chrome hard mask to the gold layer using the etch from Table 2. Once the etching was complete, the Cr hard mask … WebHard photolithography mask for SU-8 exposure. It is the most used in microelectronic, the glass or quartz is covered by a thin layer of chrome and by resin. This resin is attacked thanks to a laser that is going to define the resolution possible for the mask (basically ~ 1µm). The chrome is thus free of resin and can be attacked by a solution. WebAug 1, 2024 · It is a robust hard mask for reactive ion etching in fluorine chemistries and for ion milling • High-temperature stability and lack of reactivity enables use as an … sharron cooks